Hinnen, Paul C. : rechercher sur Z-Library

Le plus grand référentiel d'articles scientifiques au monde. 70,000,000+ d'articles gratuitement.

Don't use scam websites

Livres
Articles (24)
Les plus populaires
Liste
- Liste
- Tableau

1

Holistic optimization architecture enabling sub-14-nm projection lithography

Mulkens, Jan, Hinnen, Paul, Kubis, Michael, Padiy, Alexander, Benschop, Jos

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2014

Langue:

english

Fichier:

PDF, 4.53 MB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Driving imaging and overlay performance to the limits with advanced lithography optimization

Mulkens, Jan, Finders, Jo, van der Laan, Hans, Hinnen, Paul, Kubis, Michael, Beems, Marcel, Conley, Will

Année:

2012

Langue:

english

Fichier:

PDF, 1.73 MB

english, 2012

3

Fluorine-18 labelling of a series of potential EGFRvIII targeting peptides with a parallel labelling approach using [18F]FPyME

Charlotte L. Denholt, Bertrand Kuhnast, Frédéric Dollé, Francoise Hinnen, Paul R. Hansen, Nic Gillings, Andreas Kjær

Journal:

Journal of Labelled Compounds and Radiopharmaceuticals

Année:

2010

Langue:

english

Fichier:

PDF, 153 KB

english, 2010

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.

Benschop, Jos, Conley, Will, Engelen, Andre, Cramer, Hugo, Kubis, Michael, Hinnen, Paul, van der Laan, Hans, Bhattacharyya, Kaustuve, Mulkens, Jan

Année:

2013

Langue:

english

Fichier:

PDF, 1.38 MB

english, 2013

5

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - The application of SMASH alignment system for 65-55-nm logic devices

Miyasaka, M., Archie, Chas N., Saito, H., Tamura, T., Uchiyama, T., Hinnen, Paul, Lee, Hyun-Woo, van Kemenade, Marc, Shahrjerdy, Mir, van Leeuwen, Robert

Année:

2007

Langue:

english

Fichier:

PDF, 769 KB

english, 2007

6

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization

Warrick, Scott, Smith, Bruce W., Hinnen, Paul, Morton, Rob, Cooper, Kevin, Sassoulas, Pierre-Olivier, Depre, Jerome, Navarro, Ramon, van Haren, Richard, Browning, Clyde, Reber, Doug, Megens, Henry

Année:

2005

Langue:

english

Fichier:

PDF, 239 KB

english, 2005

7

A demonstration of the Franck—Condon principle upon ionization

Maarten G.H. Boogaarts, Paul C. Hinnen, Gerard Meijer

Journal:

Chemical Physics Letters

Année:

1994

Langue:

english

Fichier:

PDF, 381 KB

english, 1994

8

Timing of 5-aminolaevulinic acid-induced photodynamic therapy for the treatment of patients with Barrett’s oesophagus

Petra Hinnen, Felix W.M de Rooij, Wim C.J Hop, Annie Edixhoven, Herman van Dekken, J.H.Paul Wilson, Peter D Siersema

Journal:

Journal of Photochemistry and Photobiology B: Biology

Année:

2002

Langue:

english

Fichier:

PDF, 156 KB

english, 2002

9

[IEEE 2013 24th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2013) - Saratoga Springs, NY (2013.5.14-2013.5.16)] ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference - Scatterometry-based on-product focus measurement and monitoring

Hinnen, Paul, Wang, Vivien, Mardanpour, Hossein, Beltman, Jan, Rottenkolber, Erica, Leewis, Christian, Brunner, Timothy A., Wong, Cheuk W., Rawat, Pawan

Année:

2013

Langue:

english

Fichier:

PDF, 1.42 MB

english, 2013

10

Rydberg-valence interactions of CO, and spectroscopic evidence characterizing the C[sup ʹ] [sup 1]Σ[sup +] valence state

Eidelsberg, Michèle, Launay, Françoise, Ito, Kenji, Matsui, Takashi, Hinnen, Paul C., Reinhold, Elmar, Ubachs, Wim, Huber, Klaus P.

Journal:

The Journal of Chemical Physics

Année:

2004

Langue:

english

Fichier:

PDF, 525 KB

english, 2004

11

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Flexible alignment mark design applications using a next generation phase grating alignment system

Hinnen, Paul, Lee, Hyun-Woo, Keij, Stefan, Takikawa, Hiroaki, Asanuma, Keita, Ishigo, Kazutaka, Higashiki, Tatsuhiko, Silver, Richard M.

Année:

2005

Langue:

english

Fichier:

PDF, 314 KB

english, 2005

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Intra-field patterning control using high-speed and small-target optical metrology of CD and focus

Cain, Jason P., Sanchez, Martha I., Cramer, Hugo, Petra, Stefan, Fagginger Auer, Bastiaan Onne, Smilde, Henk-Jan, Wisse, Baukje, Welch, Steven, Kruijswijk, Stefan, Hinnen, Paul, Segers, Bart, Leewis,

Année:

2015

Langue:

english

Fichier:

PDF, 1.63 MB

english, 2015

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements

Mulkens, Jan, Conley, Will, Kubis, Michael, Hinnen, Paul, de Graaf, Roelof, van der Laan, Hans, Padiy, Alexander, Menchtchikov, Boris

Année:

2013

Langue:

english

Fichier:

PDF, 1.43 MB

english, 2013

14

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Advances in process overlay

Hinnen, Paul C., Megens, Henry J. L., van der Schaar, Maurits, van Haren, Richard J. F., Mos, Evert C., Lalbahadoersing, Sanjay, Bornebroek, Frank, Laidler, David W., Sullivan, Neal T.

Année:

2001

Langue:

english

Fichier:

PDF, 653 KB

english, 2001

15

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Improving 1D optical proximity effect matching for 45-nm node by scatterometry metrology

Chang, Dennis, Chen, Alek C., Han, Woo-Sung, Jungblut, Reiner, Shieh, Jason, Lin, Burn J., Yen, Anthony, Chen, Alek, Hinnen, Paul, Megens, Henry, Schreel, Koen

Année:

2009

Langue:

english

Fichier:

PDF, 295 KB

english, 2009

16

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Integration of a new alignment sensor for advanced technology nodes

Hinnen, Paul, Flagello, Donis G., Depre, Jerome, Tanaka, Shinichi, Lim, Ser-Yong, Brioso, Omar, Shahrjerdy, Mir, Ishigo, Kazutaka, Kono, Takuya, Higashiki, Tatsuhiko

Année:

2007

Langue:

english

Fichier:

PDF, 414 KB

english, 2007

17

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Overlay performance with advanced ATHENA alignment strategies

Huijbregste, Jeroen, van Haren, Richard J. F., Jeunink, Andre, Hinnen, Paul C., Swinnen, Bart, Navarro, Ramon, Simons, Geert, van Bilsen, Frank, Tolsma, Hoite, Megens, Henry J. L., Herr, Daniel J.

Année:

2003

Langue:

english

Fichier:

PDF, 136 KB

english, 2003

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - 3D features measurement using YieldStar, an angle resolved polarized scatterometer

Raymond, Christopher J., Charley, Anne-Laure, Leray, Philippe, D'havé, Koen, Cheng, Shaunee, Hinnen, Paul, Li, Fahong, Vanoppen, Peter, Dusa, Mircea

Année:

2011

Langue:

english

Fichier:

PDF, 1.45 MB

english, 2011

19

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Advances in process overlay: alignment solutions for future technology nodes

Megens, Henry, Archie, Chas N., van Haren, Richard, Musa, Sami, Doytcheva, Maya, Lalbahadoersing, Sanjay, van Kemenade, Marc, Lee, Hyun-Woo, Hinnen, Paul, van Bilsen, Frank

Année:

2007

Langue:

english

Fichier:

PDF, 380 KB

english, 2007

20

SPIE Proceedings [SPIE SPIE Optical Systems Design - Marseille, France (Monday 5 September 2011)] Optical Fabrication, Testing, and Metrology IV - 3D features measurement using YieldStar: an angle resolved polarized scatterometer

Charley, Anne-Laure, Duparré, Angela, Geyl, Roland, Leray, Philippe, D'havé, Koen, Cheng, Shaunee, Hinnen, Paul, Li, Fahong, Vanoppen, Peter, Dusa, Mircea

Année:

2011

Langue:

english

Fichier:

PDF, 1.18 MB

english, 2011

21

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Integration of new alignment mark designs in dual inlaid-copper interconnect processes

Warrick, Scott P., Hinnen, Paul C., van Haren, Richard J. F., Smith, Chris J., Megens, Henry J. L., Fu, Chong-Cheng, Yen, Anthony

Année:

2002

Langue:

english

Fichier:

PDF, 178 KB

english, 2002

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Focus and dose deconvolution technique for improved CD control of immersion clusters

Charley, Anne-Laure, Raymond, Christopher J., D'havé, Koen, Leray, Philippe, Laidler, David, Cheng, Shaunee, Dusa, Mircea, Hinnen, Paul, Vanoppen, Peter

Année:

2010

Langue:

english

Fichier:

PDF, 1016 KB

english, 2010

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - A single metrology tool solution for complete exposure tool setup

Laidler, David, Raymond, Christopher J., D'havé, Koen, Charley, Anne-Laure, Leray, Philippe, Cheng, Shaunee, Dusa, Mircea, Vanoppen, Peter, Hinnen, Paul

Année:

2010

Langue:

english

Fichier:

PDF, 1.27 MB

english, 2010

24

[AIP The 7th international symposium: Resonance ionization spectroscopy 1994 - Bernkastel-Kues, Germany (3−8 Jul 1994)] AIP Conference Proceedings - REMPI, SEP and MATI on laser desorbed diphenyl-amine

Boogaarts, Maarten G. H., Hinnen, Paul C., Holleman, Iwan, Jongma, Rienk T., Meijer, Gerard

Année:

1995

Langue:

english

Fichier:

PDF, 523 KB

english, 1995